SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

An apparatus for fabricating a semiconductor is provided to prevent polymer from being deposited on a door by making the door have a temperature not lower than that of the inner wall of a chamber. An inlet/outlet through which a substrate is loaded/unloaded is formed in a chamber in which a space for performing a semiconductor process is performed. The inlet/outlet of the chamber is opened/closed by a door(114). At least one heater member(130) is included in the door to heat the door. A dry etch process or a chemical vapor deposition process is performed on the wafer in the chamber. The chamber further includes a temperature detecting part and a control part. The temperature detecting part measures the temperature of the inner wall of the chamber. The control part receives an electrical signal transferred from the temperature detecting part to control the heater member.