| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus and a substrate treatment method capable of reducing space required for a driving mechanism or the like of a cup driving mechanism and an aligning mechanism, and capable of reducing cost. SOLUTION: The apparatus 45A is provided with a holding mechanism 61 for holding a substrate W, cups 62, 63 surrounding the substrate W held by the holding mechanism 61, and an aligning mechanism 65 for aligning the position of the substrate W to the holding mechanism 61. Further, the apparatus is provided with a moving mechanism 66 for relatively moving up and down the cups 62, 63, and the aligning mechanism 65 from the substrate W held by the holding mechanism 61. COPYRIGHT: (C)2007,JPO&INPIT |
