| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which is equipped with an air supply and exhausting means and can uniformly supply air to a substrate and exhaust it. SOLUTION: The substrate processing apparatus 20 is equipped with a plurality of air exhaustion ducts 23 which are provided in a processing tank 22 for chemically processing the substrate 21 to face both width-directional ends of the carried substrate and exhaust gas produced when the substrate is chemically processed, air capacity equalizing plates 24 which are provided in the exhaustion ducts and equalize the capacity of the exhausted gas in the conveying direction of the substrate, and an aggregate exhaustion pipe 25 to which the plurality of exhaustion ducts are connected. Together with the air supplied from an air supply means 28 to the surface of the substrate through air supply guide plates 27 provided between the exhaustion ducts, the gas produced when the substrate is chemically processed passes through the exhaustion ducts and air capacity equalizing plates to have air capacity equalized in the substrate conveying direction, and then gathered in the aggregate exhaustion pipe and exhausted. COPYRIGHT: (C)2007,JPO&INPIT
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