| 摘要 |
Even if a process cylinder of a CVD machine, wherein a chemical which is a starting material for CVD is stored, becomes empty, a chemical of the same kind can be filled into the process cylinder in a short time without exchanging the process cylinder. In a path made of a pipe wherein a chemical is supplied from a sealed fixed cylinder arranged in a chemical supplying device to a sealed process cylinder arranged in a CVD machine, the chemical in the fixed cylinder is pressured with He gas, thereby supplying the chemical from the fixed cylinder to the process cylinder. Next, the pressure in the process cylinder is lowered and then He gas is introduced from another path connected to the above-mentioned path and made of a pipe into the above-mentioned path, thereby pressuring the chemical present in the above-mentioned path.
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