发明名称 METHOD AND APPARATUS OF DEPOSITING LOW TEMPERATURE INORGANIC FILMS ON PLASTIC SUBSTRATES
摘要 A method and apparatus for depositing a low temperature inorganic film onto large area plastic substrates are described in this invention. Low temperature (<80‹C) inorganic films do not adhere very well to the plastic substrate. Therefore, a low temperature (<80‹C) plasma pre-treatment is added to improve the adhesion property. The inorganic film with plasma pre-treatment shows good adhesion and hermetic properties. ® KIPO & WIPO 2007
申请公布号 KR20070012508(A) 申请公布日期 2007.01.25
申请号 KR20067024492 申请日期 2006.11.22
申请人 APPLIED MATERIALS INC. 发明人 HOU LI;WON, TAE KYUNG
分类号 C23C16/02;C23C16/30;C23C16/34;C23C16/40;C23C16/505;H01L51/52 主分类号 C23C16/02
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