RESIST COMPOSITION AND METHOD OF RESIST PATTERN FORMATION

摘要

A resist composition dissolved in an organic solvent containing ethyl lactate, which suppresses its sensitivity deterioration by aging and exhibits demanded lithographic performance; and a method of resist pattern formation. This resist composition is produced by dissolving resin component (A) whose alkali solubility is changed by the action of an acid, acid generator component (B) capable of generating an acid upon exposure to radiation, amine (D) and acetic acid in organic solvent (S) containing ethyl lactate.