| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device highly accurately executing focus adjustment at the outer periphery of a substrate, and also to provide a pattern exposure method using the same. <P>SOLUTION: The exposure device (1) includes: a support (16) on which the substrate (12) is placed; a movable part (21) with a plane (21a) which is located close to the periphery of the support (16) and provided freely movably along the nearly normal-line direction of the surface of the substrate (12) placed on the support (16); a light source (2) for emitting light to a region over the surface of a photosensitive coating film (20) on the outer periphery of the substrate (12) and the plane (21a) of the movable part (21); a light-receiving part (10) for measuring the intensity of reflected light by receiving the reflected light, which is reflected with at least a part of the region, of the light emitted from the light source (2); and an adjustment (22) for adjusting the position of the movable part (21) in the nearly normal-line direction on the basis of the intensity of the reflected light. <P>COPYRIGHT: (C)2007,JPO&INPIT |
