| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that can suppress degradation in exposure performance, and a method for reducing contamination. <P>SOLUTION: The exposure apparatus is equipped with: a spatial optical modulator having a large number of pixels two-dimensionally arranged and individually modulating the irradiating light; a light source to irradiate the spatial optical modulator with light; and an imaging optical system which includes a microlens array 54 comprising arrayed microlenses 60 condensing light from the respective pixels of the spatial optical modulator, and which directly projects an image by the light modulated by the spatial optical modulator onto an exposure surface through the microlens array 54. In this exposure apparatus, an electrode pad 55 is disposed on the surface of the microlens array 54 opposing to a photosensitive material 12, as a reducing means to reduce contamination of the microlens array 54, and a negative voltage is applied on the pad to attract positively charged suspended substances 59. <P>COPYRIGHT: (C)2007,JPO&INPIT |
