发明名称 METHOD FOR MANUFACTURING ELECTROOPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electro-optical device in which the thickness of a liquid crystal layer can be formed uniformly in a flat surface, even when a TFD element is formed in a partial region on a layer below the liquid crystal layer by improving a resin layer forming method. <P>SOLUTION: The method for manufacturing the electro-optical device which has an element 21 formed on a substrate 7a and a resin film 22', having a projecting and recessing pattern on its surface and formed so as to cover the element 21, has steps: of forming the element 21 on the substrate 7a (a); and of forming the resin film 22' on the substrate 7a so as to cover the element 21 (b, c). In the step of forming the resin film 22', the amounts of exposure to the resin film 22' are made different, between in a region K where the element 21 is mounted and in other regions where it is not mounted, in order to remove the resin film 22' more in the region K, where the element 21 is mounted than in the other regions where the element 21 is not mounted. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007017823(A) 申请公布日期 2007.01.25
申请号 JP20050201177 申请日期 2005.07.11
申请人 SANYO EPSON IMAGING DEVICES CORP 发明人 OTAKE TOSHIHIRO;HORIGUCHI MASAHIRO;IMAI KATSUHIRO;KAMIJO KIMITAKA
分类号 G02F1/1362;G02F1/1335;G02F1/1365;G09F9/30 主分类号 G02F1/1362
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