发明名称 SEMICONDUCTOR ON INSULATOR SUBSTRATE AND DEVICE FORMED THEREFROM
摘要 <p>A semiconductor on insulator (SOI) device is comprised of a layer of a dielectric material (52) having a perovskite lattice, such as a rare earth scandate. The dielectric material (52) is selected to have an effective lattice constant that enables growth of semiconductor material (54) having a diamond lattice directly on the dielectric (52). Examples of the rare earth scandate dielectric include gadolinium scandate (GdScO3), dysprosium scandate (DyScO3), and alloys of gadolinium and dysprosium scandate (Gd1-XDyXSc03). ® KIPO & WIPO 2007</p>
申请公布号 KR20070012458(A) 申请公布日期 2007.01.25
申请号 KR20067023279 申请日期 2005.03.28
申请人 ADVANCED MICRO DEVICES, INC. 发明人 XIANG QI
分类号 H01L29/786;H01L21/20;H01L21/31 主分类号 H01L29/786
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