WAFER COATING APPARATUS AND WAFER COATING METHOD USING THE SAME

摘要

A method and an apparatus for coating a wafer are provided to coat a self-assembly monomer film on wafer surfaces according to a Langmuir-Blodgett scheme. An apparatus for coating a wafer includes a solution tub(100) and a jig unit(280). Solution and self-assembly monomers are contained in the solution tub. The self-assembly monomer floats on a surface of the solution. The jig unit impregnates or lifts up plural wafers into and from the solution tub. The jig unit includes a jig(200) and a lift(290). The jig holds the wafers. The lift is connected to the jig. The jig includes plural holders(210) and a driving unit(230). The holders grasp the respective wafers. The driving unit drives the holders.