发明名称 EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that can suppress degradation in exposure performance. <P>SOLUTION: The exposure apparatus is equipped with: a spatial optical modulator having a large number of pixels two-dimensionally arranged and individually modulating the irradiating light; a light source to irradiate the spatial optical modulator with light; and an imaging optical system which includes a microlens array 54 comprising arrayed microlenses 60 condensing the light from the respective pixels of the spatial optical modulator, and which directly projects an image by the light modulated by the spatial optical modulator onto an exposure surface through the microlens array. In this exposure apparatus, an electrode pad 55 is disposed on the surface of the microlens array 54 opposing to a photosensitive material 12, as a degradation suppressing means to suppress degradation in the exposure performance due to contamination of the microlens array 54, and a negative voltage is applied on the pad to attract positively charged suspended substances 59. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007017895(A) 申请公布日期 2007.01.25
申请号 JP20050202083 申请日期 2005.07.11
申请人 FUJIFILM HOLDINGS CORP 发明人 OZAKI TAKAO;KAGAMI TAMITO
分类号 G03F7/20;G02B26/08;G02B27/18;H01L21/027 主分类号 G03F7/20
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