发明名称 ION MILLING DEVICE, AND ION MILLING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an ion milling device and an ion milling method where, when the regulation of the shielding positions between a sample and a mask is performed with high precision, it can be easily performed without taking time in the regulation, and further, whether the sample and the mask are tightly stuck or not can be confirmed. SOLUTION: Upon the regulation of the shielding positional relation between a mask and a sample, a sample mask unit fine adjustment mechanism in which a sample mask unit is installed is removed from a sample fine adjustment base and is mounted on a fixing stand in an optical microscope, the shielding positional relation of the mask to the sample is regulated by a mask position regulating part, upon ion milling, the sample mask unit fine adjustment mechanism in which the sample mask unit provided with the mask whose shielding positional relation to the sample has been regulated is installed is returned to the sample fine adjustment base at a decided position with reproducibility by a shaft and a hole for positioning. Further, the optical microscope is provided with an another fixing stand, the sample mask unit is installed in the fixing stand, and whether the sample and the mask are tightly stuck or not can be confirmed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007014996(A) 申请公布日期 2007.01.25
申请号 JP20050200441 申请日期 2005.07.08
申请人 HITACHI HIGH-TECH SCIENCE SYSTEMS CORP 发明人 IWATANI TORU;MUTO HIROSHI;TAKABORI SAKAE
分类号 B23K15/00;H01J37/30 主分类号 B23K15/00
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