发明名称 Semiconductor failure analysis apparatus, failure analysis method, and failure analysis program
摘要 A failure analysis apparatus 10 is composed of an inspection information acquirer 11 for acquiring a failure observed image P 2 of a semiconductor device, a layout information acquirer 12 for acquiring layout information, a failure analyzer 13 for analyzing a failure of the semiconductor device, and an analysis screen display controller 14 for letting a display device 40 display information about a result of the analysis. The failure analyzer 13 sets an analysis region with reference to the failure observed image P 2 , and extracts a net passing the analysis region, from a plurality of nets included in a layout of the semiconductor device. This substantializes a semiconductor failure analysis apparatus, analysis method, and analysis program capable of securely and efficiently performing the analysis of the failure of the semiconductor device.
申请公布号 US2007020781(A1) 申请公布日期 2007.01.25
申请号 US20060409272 申请日期 2006.04.24
申请人 HAMAMATSU PHOTONICS K.K. 发明人 MAJIMA TOSHIYUKI;SHIMASE AKIRA;TERADA HIROTOSHI;HOTTA KAZUHIRO;TAKEDA MASAHIRO
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
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