发明名称 ALIGNMENT PROCESSING MECHANISM AND SEMICONDUCTOR PROCESSING DEVICE USING IT
摘要 <p>An alignment processing mechanism 10 according to the present invention includes: a conveying mechanism 11 for conveying a substrate W to be processed, an alignment mechanism 12 for aligning the substrate W conveyed by the conveying mechanism 11 to a predetermined direction, and a buffer mechanism 13 for relaying the substrate W from the conveying mechanism 11 to the alignment mechanism 12. The buffer mechanism 13 is adapted to temporarily hold the substrate W conveyed by the conveying mechanism 11, and to pass the temporarily holding substrate W to the alignment mechanism 12 based on a state of the alignment mechanism 12. According to the present invention, the alignment mechanism 12 can be used with greater efficiency in order to achieve a high speed of an alignment process. &lt;IMAGE&gt;</p>
申请公布号 EP1079429(B1) 申请公布日期 2007.01.24
申请号 EP19990910835 申请日期 1999.04.02
申请人 TOKYO ELECTRON LIMITED 发明人 OZAWA, MASAHITO;NARUSHIMA, MASAKI
分类号 H01L21/68;B65G49/07;H01L21/677 主分类号 H01L21/68
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