SILICON MONOCRYSTAL WAFER PROCESSING DEVICE, AND METHOD OF MANUFACTURING SILICON MONOCRYSTAL WAFER AND SILICON EPITAXIAL WAFER

摘要

A silicon single crystal wafer process apparatus (10) having: a process chamber (11); a susceptor (12) which is disposed in the process chamber (11), and on an upper surface of which the silicon single crystal wafer (19) is placed; and a lift pin (14) which is provided to be capable of a going up and down operation with respect to the susceptor (12), for attaching or detaching the silicon single crystal wafer (19) to or from the susceptor (12) with the going up and down operation, in a state to support the silicon single crystal wafer (19) from a lower surface side, wherein the lift pin (14) is subjected to polishing on a contact end surface (14d) which contacts with a rear surface of the silicon single crystal wafer (19).