发明名称 COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME
摘要 <p>An insulating-film-forming composition including an organic solvent and a hydrolysis-condensation product which is obtained by hydrolysis and condensation of a component (A) in the presence of a component (B), the component (A) being at least one silane compound selected from a group consisting of compounds shown by the following formulas (1) to (3), €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒR a Si(OR 1 ) 4-a €ƒ€ƒ€ƒ€ƒ€ƒ(1) €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒSi(OR 2 ) 4 €ƒ€ƒ€ƒ€ƒ€ƒ(2) €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒR 3 b (R 4 O) 3-b Si-(R 7 ) d -Si(OR 5 ) 3-c R 6 c €ƒ€ƒ€ƒ€ƒ€ƒ(3) wherein the component (B) is a polycarbosilane having a main chain structure shown by the formula -(Si-CH 2 ) x - and containing a structure shown by the following formula (4), a structure shown by the following formula (5), a structure shown by the following formula (6), and a structure shown by the following formula (7), wherein R 8 is selected from a group consisting of a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxyl group, and an acyloxyl group, wherein R 9 and R 10 are individually selected from the group consisting of a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxyl group, and an acyloxyl group, wherein R 11 to R 13 are individually selected from the group consisting of a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxyl group, and an acyloxyl group.</p>
申请公布号 EP1746139(A1) 申请公布日期 2007.01.24
申请号 EP20050737241 申请日期 2005.04.28
申请人 JSR CORPORATION 发明人 AKIYAMA, MASAHIRO;NAKAGAWA, HISASHI;KUROSAWA, TAKAHIKO;SHIOTA, ATSUSHI
分类号 C09D5/25;C09D183/14;B05D5/12;B05D7/24;C08G77/50;C08G77/60;C08L83/14;C09D7/12;C09D183/00;C09D183/02;C09D183/04;C09D183/08;C09D183/10;C09D183/16;H01B3/30;H01B3/46;H01L21/312 主分类号 C09D5/25
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