| 摘要 |
A wet cleaning apparatus is provided to rapidly exhaust a chemical processing agent existing in an inner bath when an apparatus is out of order by including a large-diameter exhaust hole for an exclusive use of water drainage, a wafer exhausting line and a quick drain valve. A wafer is received and cleaned by a chemical processing agent in an inner bath(113). The inner bath is received in an outer bath(112). A hole(114) for supplying and exhausting water is formed in the bottom of the inner bath to supply or exhaust the chemical processing agent and deionized water. A line for supplying and exhausting water is connected to the hole for supplying and exhausting water. An exhausting hole(118) for an exclusive use of water drainage is installed in the inner bath. A water exhausting line is connected to the exhausting hole for the exclusive use of water drainage. A quick drain valve(120) is installed in the water exhausting line to rapidly exhaust the chemical processing agent. When an apparatus is out of order, a control part(121) sends an electrical signal to the quick drain valve to open the quick drain valve so that the chemical processing agent can be exhausted. A pair of shower units(123) injects deionized water toward the wafer in the inner bath when the apparatus is out of order, including shower units for injecting deionized water toward the front and the back surfaces of the wafer.
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