METHOD FOR PHOTOLITHOGRAPHIC STRUCTURING BY MEANS OF A CARBON HARD MASK LAYER WHICH HAS A DIAMOND-LIKE HARDNESS AND IS PRODUCED BY MEANS OF A PLASMA-ENHANCED DEPOSITION METHOD
摘要
申请公布号
EP1444724(B1)
申请公布日期
2007.01.24
申请号
EP20020776865
申请日期
2002.10.29
申请人
INFINEON TECHNOLOGIES AG
发明人
CZECH, GUENTHER;FUELBER, CARSTEN;KIRCHHOFF, MARKUS;STEGEMANN, MAIK;VOGT, MIRKO;WEGE, STEPHAN
