发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME |
摘要 |
<p>A semiconductor memory device is provided to blow a residual metal pattern positioned on a conductive pattern when a conductive pattern explodes thermally by forming a conductive pattern under a fuse such that the conductive pattern absorbs energy of a laser beam to explode thermally. An insulation layer is formed on a substrate in a fuse region. A fuse(220c) is positioned on the insulation layer, having a stack structure composed of a conductive pattern(212a,212c) and a metal pattern(216a,216c). The conductive pattern can be a polysilicon pattern. The conductive pattern is made of a material which absorbs energy of a laser beam to explode thermally. The metal pattern is stacked on the conductive pattern. The insulation layer can be formed on a capacitor positioned in a cell array region.</p> |
申请公布号 |
KR20070010420(A) |
申请公布日期 |
2007.01.24 |
申请号 |
KR20050064965 |
申请日期 |
2005.07.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
MUN, CHEAR YEON |
分类号 |
H01L21/82;H01L21/66;H01L21/8242 |
主分类号 |
H01L21/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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