发明名称 Film bulk acoustic wave resonator and manufacturing method thereof
摘要 A film bulk acoustic resonator includes a substrate (101); a lower electrode (110) formed on top of the substrate (101); a piezoelectric membrane (113) formed on top of the lower electrode (110) and having a crystallographic axis (CC) so inclined as to generate a total reflection when an acoustic wave advances toward the lower electrode (110); and an upper electrode (115) formed on top of the piezoelectric membrane (113). The circumference of the piezoelectric membrane (113) may comprise an enveloping wall (117) which may be patterned on the same layer as that of forming the upper electrode (115).
申请公布号 EP1746722(A2) 申请公布日期 2007.01.24
申请号 EP20060253526 申请日期 2006.07.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, DUCK-HWAN;PARK, YUN-KWON;KIM, CHUL-SOO;SUL, SANG-CHUL;HA, BYEOUNG-JU;SONG, IN-SANG
分类号 H03H9/17;H01L41/09;H01L41/18;H01L41/187;H01L41/22;H01L41/23;H01L41/316;H03H3/02 主分类号 H03H9/17
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