| 摘要 |
[PROBLEMS] To provide a vacuum treatment device capable of reducing the occurrence of the tilt and deformation of treated materials by suppressing the heating of a substrate by a heat generated by continuous spattering in a vacuum. [MEANS FOR SOLVING PROBLEMS] This vacuum treatment device is characterized by comprising a main chamber (10) capable of being vacuated in a vacuum state, a load lock mechanism (20) carrying disk-like treated materials (101) into and out of the main chamber while holding the vacuum state of the main chamber, a horizontal rotary carrying table (50) disposed in the main chamber (10), having a plurality of susceptors (57) exchanging the disk- like treated materials with the load lock mechanism (20) for mounting, rotated about a rotating shaft (52), and forming a carrying route for the disk-like treated materials, a plurality of film-forming chambers (30) for forming a multi-layer film on the disk-like treated materials disposed in the main chamber along a circumference about the rotating shaft (52) and carried by the rotary carrying table, and cooling mechanisms (40) disposed between the film-forming chambers and cooling the disk-like treated materials. ® KIPO & WIPO 2007
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