发明名称 |
MASK, MASK MANUFACTURING METHOD, FILM FORMING METHOD, ELECTRO-OPTIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC APPARATUS |
摘要 |
A mask, a mask manufacturing method, a film forming method, an electro-optic device manufacturing method, and an electronic apparatus are provided to easily perform exchange of a chip by separating a plug from a base substrate. A base substrate(10) includes an aperture portion(12). A chip(20) having an aperture pattern is arranged on the aperture portion of the base substrate. A plug is formed on the base substrate. A joint element joints the chip and the plug each other. The plug is made of different material with the base substrate. One chip has a plurality of plugs. |
申请公布号 |
KR20070011150(A) |
申请公布日期 |
2007.01.24 |
申请号 |
KR20060067123 |
申请日期 |
2006.07.18 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KOEDA HIROSHI;YOTSUYA SHINICHI |
分类号 |
H05B33/10;C23C14/24 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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