发明名称 MASK, MASK MANUFACTURING METHOD, FILM FORMING METHOD, ELECTRO-OPTIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC APPARATUS
摘要 A mask, a mask manufacturing method, a film forming method, an electro-optic device manufacturing method, and an electronic apparatus are provided to easily perform exchange of a chip by separating a plug from a base substrate. A base substrate(10) includes an aperture portion(12). A chip(20) having an aperture pattern is arranged on the aperture portion of the base substrate. A plug is formed on the base substrate. A joint element joints the chip and the plug each other. The plug is made of different material with the base substrate. One chip has a plurality of plugs.
申请公布号 KR20070011150(A) 申请公布日期 2007.01.24
申请号 KR20060067123 申请日期 2006.07.18
申请人 SEIKO EPSON CORPORATION 发明人 KOEDA HIROSHI;YOTSUYA SHINICHI
分类号 H05B33/10;C23C14/24 主分类号 H05B33/10
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