SHADOW MASK AND ALIGNMENT APPARATUS USING THE SAME

摘要

A shadow mask and an alignment apparatus using the same are provided to increase uniformity of a pixel pattern by increasing adhesion between a substrate and the shadow mask. In a shadow mask, a plurality of opening patterns is punched on a mask body(110). A dielectric film(130) is formed on a surface of the mask body(110) and the opening pattern. The dielectric film(130) is made of one of polyimide, polyamide, and parylene polymer.