APPARATUS FOR IMPRINTING PATERN ON THE SUBSTRATE AND METHOD FOR IMPRINTING PATERN ON THE SUBSTRATE

摘要

A pattern imprinting apparatus and a method thereof are provided to easily release a resin from a mold by detaching the mold at a pressure lower than a pressure between the mold and the resin. A pattern imprinting apparatus includes a chamber(110), a pressure adjusting member(120) adjusting an internal pressure of the chamber, a lower surface plate(130) on which a substrate is positioned, an upper surface plate(140) in which a mold is positioned under the upper surface plate, an upper-surface plate moving member(150) moving the upper plate vertically, and a ultraviolet irradiating member irradiating ultraviolet rays onto an upper portion of the mold. A gas supply unit(142) is provided on the upper surface plate at a position corresponding to a gas passing hole(H).