WAFER CHUCK FOR PHOTORESIST DEVELOPMENT APPARATUS

摘要

A wafer chuck for a photoresist development apparatus is provided to develop easily a photoresist layer pattern by installing a heating unit and a cooling unit therein. A spindle(12) is installed at a lower part of a wafer chuck body(10). The spindle is connected with a driving unit. A heating coil(16a) is arranged inside the wafer chuck body. The heating coil is arranged in a spiral shape near to the wafer. A heating controller(16) is used for controlling the temperature of the heating coil. A refrigerant circulation line(18a) is arranged inside the wafer chuck body. A cooling controller(18) controls the cooling temperature by supplying a refrigerant to the cooling circulation line. A main controller(14) controls the heating controller and the cooling controller.