发明名称 LINE FOR SUPPLYING PROCESS GAS AT THE SEMICONDUCTOR DEVICE
摘要 A reaction gas supply line for semiconductor fabricating equipment is provided to attract an operator's attention by forming an outer periphery of a reaction gas supply line to have various colors. A reaction gas supply line communicates a reaction gas source(100) generating various kinds of reaction gases with a reaction chamber in which a semiconductor fabricating process is carried out by suing the reaction gas. An outer periphery of the reaction gas supply line, through which the reaction gas flows, is formed to have various colors according to the kinds of the reaction gas supplied to the reaction chamber.
申请公布号 KR20070010244(A) 申请公布日期 2007.01.24
申请号 KR20050064670 申请日期 2005.07.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, BONG JIN
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址