| 摘要 |
Semiconductor fabricating equipment is provided to prevent leak error of process gas or lifting phenomenon of a focus ring by forming a groove on a lower portion of a focus ring which contacts an insulating ring. Semiconductor fabricating equipment includes an electrostatic chuck(120) installed in a process chamber, an insulating ring(140) protecting the electrostatic chuck from plasma and interrupting the heat generated when performing etching, and a focus ring(110) formed on an upper edge of the electrostatic or an edge of wafer. The focus ring has a groove larger than a contact protruding portion of the insulating ring.
|
