发明名称 |
Laser CVD device and laser CVD method |
摘要 |
A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided. The device comprises a plasma pretreating unit for turning pretreating gas into a plasma state by arc discharge and for supplying the plasma sate gas to the film formation face; and a film forming unit having means for sealing film forming gas while being isolated from an external atmosphere, means for radiating a laser beam to the film forming gas, wherein the film is formed over the film formation face of the substrate.
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申请公布号 |
US7166167(B2) |
申请公布日期 |
2007.01.23 |
申请号 |
US20030600075 |
申请日期 |
2003.06.20 |
申请人 |
LASERFRONT TECHNOLOGIES, INC. |
发明人 |
MORISHIGE YUKIO;UEDA ATSUSHI |
分类号 |
C23C16/02;H01L21/3205;C23C16/04;C23C16/44;C23C16/455;C23C16/48;H01J37/32 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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