APPARATUS FOR CLEANING APPARATUS AND METHOD FOR SUPPLYING CLEANING LIQUID TO A BATH

摘要

A substrate cleaning apparatus and a method for supplying cleaning solution into a process bath are provided to improve efficiency of a cleaning process and to supply quickly chemicals into the bath by spraying the cleaning solution onto a wafer under a high pressure condition regardless of intensity of a jet pressure of the chemicals using an improved cleaning solution supply member composed of a plurality of nozzles with different sizes. A substrate cleaning apparatus includes a process bath(100), a support member(200) for supporting substrates in the process bath, and a cleaning solution supply member(300) for supplying cleaning solution into the process bath. The cleaning solution supply member is composed of a first nozzle(320) for supplying chemicals at an upper portion of the process bath and a second nozzle(340) for spraying the cleaning solution to the substrates under the substrates. The spray hole of the second nozzle is smaller than that of the first nozzle.