发明名称 DRAM cells with repressed floating gate memory, low tunnel barrier interpoly insulators
摘要 Structures and methods for memory cells having a volatile and a non-volatile component in a single memory cell are provided. The memory cell includes a first source/drain region and a second source/drain region separated by a channel region in a substrate. A storage capacitor is coupled to one of the first and the second source/drain regions. A floating gate opposes the channel region and separated therefrom by a gate oxide. A control gate opposes the floating gate. The control gate is separated from the floating gate by a low tunnel barrier intergate insulator. The memory cell is adapted to operate in a first and a second mode of operation. The first mode of operation is a dynamic mode of operation and the second mode of operation is a repressed memory mode of operation.
申请公布号 US7166886(B2) 申请公布日期 2007.01.23
申请号 US20040783695 申请日期 2004.02.23
申请人 发明人
分类号 H01L29/788;G11C11/404;H01L29/423;H01L29/51 主分类号 H01L29/788
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