| 发明名称 |
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF METAL OXIDE. |
| 摘要 |
<p>A metal oxide coating can be applied to a substrate (60) at a relatively low temperature and at or near atmospheric pressure by carrying a metal oxide precursor (10) and an oxidizing agent through a corona discharge (40) or a dielectric barrier discharge to form the metal oxide and deposit it onto to the substrate.</p> |
| 申请公布号 |
MXPA06013380(A) |
申请公布日期 |
2007.01.23 |
| 申请号 |
MX2006PA13380 |
申请日期 |
2005.05.20 |
| 申请人 |
DOW GLOBAL TECHNOLOGIES, INC. |
发明人 |
DMITRY P. DINEGA;CHRISTOPHER M. WEIKART |
| 分类号 |
C23C16/40;C23C16/50 |
主分类号 |
C23C16/40 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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