SUBSTRATE DOME

摘要

Substrate domes capable of suppressing the lowering of the accuracy of film thickness distribution on substrates disposed thereon by a thermal expansion and centrifugal force by the rotation of the substrate dome during film formation in the substrate dome. A vacuum device comprises a vacuum chamber and the substrate domes on which the film formation substrates are mounted and which are oppositely disposed at the bottom of the vacuum chamber. The substrate domes formed of titan or a titan alloy is formed in the vacuum device. ® KIPO & WIPO 2007