Apparatus and Method for Cleaning of Semiconductor Device using the Plasma,申请号KR20040111158-传众专利搜索

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发明名称	Apparatus and Method for Cleaning of Semiconductor Device using the Plasma
摘要
申请公布号	KR100672696(B1)	申请公布日期	2007.01.22
申请号	KR20040111158	申请日期	2004.12.23
申请人		发明人
分类号	H01L21/3065	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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