| 摘要 |
A semiconductor device includes a first insulating layer which is formed above a semiconductor substrate including a plurality of semiconductor elements and which includes lower-layer damascene wiring, a second insulating layer which is formed on the first insulating layer and which includes a second damascene wiring and an aligning wiring pattern forming a first step, and a first aligning surface wiring pattern including a surface wiring pattern to cover the second damascene wiring and a first aligning surface wiring pattern which is formed on the aligning wiring pattern and which has a second step reflecting the first step. The surface wiring pattern and the first aligning surface wiring pattern are formed using one surface wiring layer. A novel multilayer wiring structure thus obtained is suitably manufactured by the damascene process. |
