METHOD FOR FABRICATION OF NANOIMPRINT MOLD

摘要

A method for fabricating a nano-imprint mold is provided to manufacture a quartz NIL(Nano-Imprint Lithography) mold by using a mold such as a silicon substrate. An E-beam resist is coated on a substrate and an E-beam resist pattern is formed on the first substrate by performing an E-beam lithography process(S200). A photoresist pattern is formed on the first substrate by performing a photo-lithography process(S300). A pattern is formed on the first substrate by using the E-beam resist pattern and the photoresist pattern(S400). A NIL mold is formed by printing the pattern of the first substrate on a second substrate for mold(S500,S600).