| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithography equipment including a contamination-resistant barrier or a wheel trap, which suppresses charged particles in the form of plasma moving with a radiating beam, and ions moving in front of or at the back of such plasma. <P>SOLUTION: The wheel trap is arranged in a path of the radiant beam. The wheel trap includes an array of conductive strips 34. A voltage-applying circuit is connected to the strips 34 to apply a voltage difference between adjoining strip couples of the strips 34. The voltage-applying circuit includes a current-limiting circuit constituted so that the current to the strips 34 is limited to a value lower than the threshold, at which self-sustained arc discharge is be caused in the wheel trap. <P>COPYRIGHT: (C)2007,JPO&INPIT |
