| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a flare measuring device which is capable of easily measuring a flare that occurs in the optical system of an exposure device without actually subjecting a resist pattern to an exposure process, and furthermore specifying an adjuster of the exposure device when the flare occurs in the exposure device. <P>SOLUTION: An exposure light 109 radiating from a light source 101 irradiates a reticle 105 passing through a masking blade 102 and an lighting optical system unit 104. Illuminance sensors 106 and 107 are provided between the masking blade 102 and the reticle 105 so as to detect the reflected light reflecting from the lighting optical system unit 104, and to measure its light volume when a flare occurs in the lighting optical system unit 104. Information as to the flare is obtained from the presence and light volume of the reflected light detected by the illuminance sensors 106 and 107. <P>COPYRIGHT: (C)2007,JPO&INPIT |
