| 摘要 |
<P>PROBLEM TO BE SOLVED: To estimate a shape of a divided region, based on the change degree of a function that has the position coordinate of a reference position of the divided region being set variable. <P>SOLUTION: When a prescribed pattern is overlapped with the divided region formed on an exposed wafer so as to expose them, an interpolation function 413 at dislocation, where the position coordinate of the reference position of the divided region is set to be the variable in dislocation accompanying distortions in the wafer, is decided. Magnification in the prescribed direction of the divided region and an inclination 415, with respect to a prescribed axis are computed, based on the change degree of the interpolation function in the reference position. <P>COPYRIGHT: (C)2007,JPO&INPIT |
