MEASURING INSTRUMENT, LITHOGRAPHY UNIT, PROCESS APPARATUS, MEASURING METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a measuring instrument improved in sensitivity and/or an operation speed.

SOLUTION: This measuring instrument for measuring a parameter of fine structure on a substrate is provided with a supercontinuum light source constituted to generate a measurement beam, an optical system constituted to emit the measurement beam onto the substrate, and a sensor for detecting radiation reflected and/or diffracted by the structure.

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