| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for preventing leakage of plasma around an isolation valve of a plasma processing chamber. <P>SOLUTION: The method and the apparatus for grounding the valve are provided. Generally, the method makes use of an electrically conductive elastomeric member or members to effectively ground the chamber isolation valve and/or an isolation valve door while avoiding metal-to-metal contact between moving parts in the processing system. In one embodiment, the elastomeric member is attached to and in electrical communication with the door of the valve. The elastomeric member is brought into contact with a grounded component of the plasma processing system when the door is in the closed position. In another embodiment, the conductive elastomeric member is attached to a bracing member of the isolation valve and is brought into contact with a grounded component of the plasma processing system when the bracing member is deployed to hold the isolation valve door in place during substrate processing. <P>COPYRIGHT: (C)2007,JPO&INPIT |
