发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce a leakage current of a semiconductor device which is equipped with a pn junction exposed on the side of a semiconductor substrate and to enhance its wthstand voltage. SOLUTION: The semiconductor device is equipped with a semiconductor substrate provided with two main surfaces each having a (111) crystal plane and two or more side faces which have six planes equivalent to the planes of plane orientations (1, -2, 1), a second conductivity-type second semiconductor region of high-impurity concentration which is formed extending from one of the main surfaces into the inside of a first conductivity-type first semiconductor region of low-impurity concentration, a first conductivity-type third semiconductor region which is formed extending from the other main surface into the inside of the first semiconductor region, a first electrode ohmically connected to one of the main surface, and a second electrode ohmically connected to the other main surface. A joint between the second semiconductor region and the first semiconductor region is exposed on the side face. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007012952(A) 申请公布日期 2007.01.18
申请号 JP20050193295 申请日期 2005.07.01
申请人 HITACHI LTD 发明人 MURAKAMI SUSUMU;YOSHINO KATSUNOBU;SUGANO MINORU;KOKUUCHI SHIGERU;KOBAYASHI SATSUKI;TERAJIMA KENJI
分类号 H01L29/861 主分类号 H01L29/861
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