发明名称 |
PHOTOLUMINESCENCE IMAGING WITH PREFERENTIAL DETECTION OF PHOTOLUMINESCENCE SIGNALS EMITTED FROM A SPECIFIED MATERIAL LAYER OF A WAFER OR OTHER WORKPIECE |
摘要 |
<p>A method and apparatus uses photoluminescence to identify defects in one or more specified material layers of a sample. One or more filtering elements are used to filter out predetermined wavelengths of return light emitted from a sample. The predetermined wavelengths are selected such that only return light emitted from one or more specified material layers of the sample is detected. Additionally or alternatively, the wavelength of incident light directed into the sample may be selected to penetrate the sample to a given depth, or to excite only one or more selected material layers in the sample. Accordingly, defect data characteristic of primarily only the one or more specified material layers is generated.</p> |
申请公布号 |
WO2007008399(A2) |
申请公布日期 |
2007.01.18 |
申请号 |
WO2006US24938 |
申请日期 |
2006.06.27 |
申请人 |
ACCENT OPTICAL TECHNOLOGIES, INC.;HUMMEL, STEVE;WALKER, TOM |
发明人 |
HUMMEL, STEVE;WALKER, TOM |
分类号 |
G01N21/88 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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