发明名称 Lens e.g. illumination lens, for use in microlithography system, has optical lenses aligned to each other according to local distribution or variation of their optical characteristics, where lenses are arranged along optical axis
摘要 <p>The lens has a set of optical lenses that are aligned to each other according to local distribution or variation of their optical characteristics, where mutual alignment of the lenses takes place by determining an azimuthal orientation and/or rotation of the lenses around an optical axis, along which the lenses are arranged. A range of maximum deviation of the optical characteristic such as a range of transmission modulation is specified for each optical lens, where the range of maximum deviation is aligned with respect to the optical axis. An independent claim is also included for a method for manufacturing a lens.</p>
申请公布号 DE102005033376(A1) 申请公布日期 2007.01.18
申请号 DE20051033376 申请日期 2005.07.16
申请人 CARL ZEISS SMT AG 发明人 WALTER, MARKUS;EVA, ERIC;BROTSACK, MARKUS
分类号 G02B13/00;G03F7/20 主分类号 G02B13/00
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