| 摘要 |
<P>PROBLEM TO BE SOLVED: To accurately control an exposure position in an exposure processing, for form a structural member on a substrate. <P>SOLUTION: A substrate is placed on the stage 22 of an exposure device 31 and photographed by a low magnification camera 27, placed above the corner of the substrate on the basis of a temporary coordinates system defined on the stage 22 to identify a mark provided for positioning. Then an actual coordinates system is defined along the actual layout state of the substrate, on the basis of the position where the mark, is identified. Then coordinates of a predetermined reference point in the actual coordinates system are calculated, the substrate is photographed by a high magnification camera 28 placed at the position indicated by the coordinates, to identify the pattern of a structural member formed on the substrate in the preceding step. The actual position of the reference point is specified from the identified pattern, an image, to be recorded by exposure in a region specified by the actual reference point, is corrected in matching with the shape of the region specified by the actual reference point, and then the image is recorded by exposure. <P>COPYRIGHT: (C)2007,JPO&INPIT |
