| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment equipment in which liquid adhering to the surface of a substrate can be removed stably while preventing the scattering of mist. SOLUTION: A substrate W is carried in the moving direction (+X) with the facing surface 33 of a suction head 31 opposing the surface WS of the substrate such that treatment liquid adhering to the surface WS of the substrate is located lower than the liquid LL. The treatment liquid partitioned below the upstream side 35 and sandwiched by the facing surface 33 and the surface WS of the substrate has a thickness defined depending on the interval G between the facing surface 33 and the surface WS of the substrate. The quantity of liquid held between the head body 32 and the substrate W is made constant and the liquid is sucked and removed through suction openings 61 and 62. On the other hand, treatment liquid partitioned above the upstream side 35 and scratched by the side face 34 is introduced to a suction opening 63 and sucked and removed therefrom. When a part of the treatment liquid cannot be sucked, it does not adhere again to the surface WS of the substrate but is discharged limitedly to the outside of the substrate. COPYRIGHT: (C)2007,JPO&INPIT
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