ETCHING EQUIPMENT FOR FABRICATING SEMICONDUCTOR DEVICE AND CHUCK ASSEMBLY USED IN THE EQUIPMENT

摘要

A chuck assembly and semiconductor etching equipment including the same are provided to prevent a polymer from scattering towards an edge of a substrate due to a vortex flow in a chamber by forming a recessed portion on a focus ring. A chuck assembly includes a chuck body(112) supporting a center portion of a bottom surface of a substrate and a stepped portion between an edge of an upper surface and the bottom surface, a focus ring(114) supporting the stepped portion of the chuck body and having a recessed portion spaced apart from the bottom surface of the substrate, and an insulating ring(116) supporting a side and bottom surface of the focus ring. The focus ring is made of silicon.