PATTERN FORMING METHOD

摘要

Provided is a pattern forming method by which a fine pattern can be accurately formed by making a light quantity of each exposure unit uniform while suppressing cost, for exposure using a digital exposure apparatus having an exposure head wherein the exposure units are two-dimensionally distributed. The method at least includes a step wherein a photosensitive layer is irradiated with optical beams emitted from a light irradiation means, through a focusing optical system having a light distribution correcting means, and exposure is performed by irradiating the photosensitive layer with optical beams modulated by a light modulating means. In the pattern forming method, the exposure is performed by permitting light quantities of the optical beams applied on the light modulating means from the light irradiation means in an irradiation area to have distribution, and that the light quantity distribution of the optical beams modulated by the light modulating means is corrected to be uniform on the plane of the photosensitive layer to be exposed.