| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for inspecting a phase shift mask by which drawing pattern data are accurately corrected to obtain pattern inspection data, no discrepancy is generated in the pattern inspection data with respect to image data obtained in a pattern defect inspection device, and a defect can be detected with high accuracy by comparing the pattern inspection data and the image data, in the inspection of a pattern defect in an auxiliary pattern type phase shift mask having a light shielding pattern where phase shift portions are adjoining through a light shielding portion. <P>SOLUTION: The method includes the steps of: obtaining image data of a light shielding pattern by inspection light using a pattern defect inspection device; converting the pattern data for drawing a light shielding pattern into pattern inspection data with correction based on dimensional changes in the light shielding pattern image due to a difference in the inspection light intensity passing the phase shift portion and a non-phase shift part, according to the distance between the phase shift portions adjoining through at least a light shielding portion; and comparing the image data with the pattern inspection data to detect a pattern defect in the phase shift mask. <P>COPYRIGHT: (C)2007,JPO&INPIT |
