| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition apparatus which is preferably used, for instance, for oblique-depositing an inorganic oriented film for an electro-optical device such as a liquid crystal device, and improves productivity. SOLUTION: The vacuum vapor deposition apparatus 10 comprises a target chamber 100, a process chamber 200 and a flight chamber 300. When one target selected from a plurality of targets 110 arranged in a space 101 in the target chamber 100 is irradiated with an electron beam projected from an electron-beam irradiation unit 120, the target is vaporized, passes through a space 301 in the flight chamber 300, arrives at a space 201 in the process chamber 200, and deposits on a substrate 210. At this time, the electron-beam irradiation unit 120 is moved to a position corresponding to the selected one target by an electron-beam-moving unit 130. Accordingly, a plurality of the targets own the electron beam irradiation unit 120 in common. COPYRIGHT: (C)2007,JPO&INPIT
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